Products

　Resist Strip Tool

Removes photo-resist from work pieces using organic resist-stripping solutions.
The works are then rinsed in DI Water and dried in a conjoining spin dryer unit.
The Touch Panel stores up to 10 different process recipes of varying temperatures
and process times.
PVC, PP or Stainless Steel Frames. Appliable solvents: Acid and alkali solvents.
Others: Manual/Automatic operational choices, solution circulation with multi-stage filtration, temperature controls, automatic solution supply and withdrawal, pH Adjuster included.　

Spin Coater

Loader/Unloader Double-Cassette System
2 solvents can be applied to masks and wafers
Automatic retrieval system for processed works
High-speed servo motor spin function　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　　

Spin Developer

3t Base develops up to 6 wafers
Circulation spray system (with oscillating nozzle)
Simple 3-Step Process: Spray Development→Water Rinse→Spin Dry

Wafer Spin Dryer

Spin dries 5-8 inch wafers and glass work pieces in minimum time
Features include original mist-prevention mechanisms and up to 5 programable recipes including a 0-2000RPM initial rinse process and a 2-step ultra-high speed drying process

Washer Tools　　　　　　　　　Laboratory Tools

Supplementary Tools　　　